Message For Prospective Students
Our research policy is to learn thin film synthesis techniques using vacuum equipment, to make thin films by ourselves, and to characterize various physical properties by ourselves using those thin films. While gaining small successes through such daily experiments, we hope to work together to achieve interesting research objectives. Recent topics in our laboratory include topological insulators, Weil semimetals, oxides, topological properties, magnetism, and superconducting and electrical conducting properties.
We believe that the research experience in the Institute for Materials Research Tohoku University can be valuable for those who want to become researchers in companies, universities, or national institutes. In addition, thin-film research and vacuum technology are directly related to the development of diverse devices such as solar cells and magnetic memory, so this will be a useful experience.
We synthesize thin films mainly of oxides, chalcogenides, and intermetallic compounds, which are very attractive targets for condensed-matter physics, such as superconductivity, magnetism, dielectric properties, semiconductor properties, and topological properties. The highly crystalline films and the formation of atomically abrupt interfaces lead to the observation of intriguing phenomena, the development of device properties, and the improvement of functionalities.
Thin film synthesis is related to thermodynamics and solid-state chemistry, and physical properties are related to electromagnetism, quantum mechanics, and other basic subjects. Let’s aim together to play an active role in research while learning the basics. We actively support the presentation of experimental results in papers and at conferences.
Based on the basic research conducted in our laboratory, we consider a variety of themes and research targets to provide an opportunity to discover the possibilities for device applications.
If you are interested in our activities and future study in our laboratory, please feel free to contact us.